钛合金溅射靶

Item Name Titanium Alloy Sputtering Target
Shape Square/Round, according to your request
Available size Round: dia 25~250mm
Rectangular: length up to 1500mm
Customization is available
Certificates ISO9001:2008,SGS,the third test report
Impurity content Lower than 100ppm
Technics Powder metallurgy
Application Widely used in coating processing industries such as optics, photonics, nanometer materials , PDP, touch panel industry, solar cells, solar photovoltaic application ,decoration and other kind of scientific researches and industrial production fields
Advantage High Hard texture
Low impurity content
Better heat dissipation
High Tensile strength
Quality Standard (99.95% W)
Element Value (<ppm) Element Value (<ppm)
Fe 5 Mo 10
Ni 3 P 1
Al 2 C 5
Si 3 O 3
Ca 3 N 3
Mg 2
Feature Application
1.High resistance to radiation; 1.Automation machine
2.High ultimate tensile strength; 2.Medical device, industrial machine
3.High temperature resistance; 3.Automobile, electric appliance
4. Weldability and oxidation resistance greatly enhanced; 4.Industries ( guns, artillery, rockets, satellite, airplane and ship )
5.Deep processing property significantly increased 5.Microelectronics such as Ultra Large Scale IC(ULSI)
6.Yield increase and cost reduction. 6.Automotive lights and decorative coating etc



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